Synthesis and characterization of rf-planar magnetron sputtered KTa xNb1-xO3 thin films

S. R. Sashital, S. Krishnakumar, S. Esener

Research output: Contribution to journalArticle

25 Scopus citations

Abstract

Thin ferroelectric films of potassium tantalate niobate (KTN) have been grown by rf planar magnetron sputtering on sapphire, platinum coated silicon, and GaAs substrates. X-ray diffraction analysis indicate epitaxial growth with (100) orientation. The KTN films exhibit dielectric anomalies at temperatures between -4 and 9°C and peak dielectric constant ε of nearly 2000. Films have a smooth surface morphology, and excellent optical transparency. The electro-optic effect and electrical properties of such KTN thin films are reported.

Original languageEnglish (US)
Pages (from-to)2917-2919
Number of pages3
JournalApplied Physics Letters
Volume62
Issue number23
DOIs
StatePublished - Dec 1 1993
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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