Synthesis and characterization of rf-planar magnetron sputtered KTa xNb1-xO3 thin films

S. R. Sashital, S. Krishnakumar, S. Esener

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

Thin ferroelectric films of potassium tantalate niobate (KTN) have been grown by rf planar magnetron sputtering on sapphire, platinum coated silicon, and GaAs substrates. X-ray diffraction analysis indicate epitaxial growth with (100) orientation. The KTN films exhibit dielectric anomalies at temperatures between -4 and 9°C and peak dielectric constant ε of nearly 2000. Films have a smooth surface morphology, and excellent optical transparency. The electro-optic effect and electrical properties of such KTN thin films are reported.

Original languageEnglish (US)
Pages (from-to)2917-2919
Number of pages3
JournalApplied Physics Letters
Volume62
Issue number23
DOIs
StatePublished - Dec 1 1993
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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