Synthesis and characterization of rf-planar magnetron sputtered KTa _xNb_1-xO₃ thin films

Thin ferroelectric films of potassium tantalate niobate (KTN) have been grown by rf planar magnetron sputtering on sapphire, platinum coated silicon, and GaAs substrates. X-ray diffraction analysis indicate epitaxial growth with (100) orientation. The KTN films exhibit dielectric anomalies at temperatures between -4 and 9°C and peak dielectric constant ε of nearly 2000. Films have a smooth surface morphology, and excellent optical transparency. The electro-optic effect and electrical properties of such KTN thin films are reported.