Synthesis and characterization of rf-planar magnetron sputtered KTa xNb1-xO3 thin films

S. R. Sashital, S. Krishnakumar, Sadik Esener

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Thin ferroelectric films of potassium tantalate niobate (KTN) have been grown by rf planar magnetron sputtering on sapphire, platinum coated silicon, and GaAs substrates. X-ray diffraction analysis indicate epitaxial growth with (100) orientation. The KTN films exhibit dielectric anomalies at temperatures between -4 and 9°C and peak dielectric constant ε of nearly 2000. Films have a smooth surface morphology, and excellent optical transparency. The electro-optic effect and electrical properties of such KTN thin films are reported.

Original languageEnglish (US)
Pages (from-to)2917-2919
Number of pages3
JournalApplied Physics Letters
Volume62
Issue number23
DOIs
StatePublished - 1993
Externally publishedYes

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synthesis
thin films
niobates
electro-optics
potassium
magnetron sputtering
sapphire
platinum
electrical properties
permittivity
anomalies
silicon
diffraction
x rays
temperature

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Synthesis and characterization of rf-planar magnetron sputtered KTa xNb1-xO3 thin films. / Sashital, S. R.; Krishnakumar, S.; Esener, Sadik.

In: Applied Physics Letters, Vol. 62, No. 23, 1993, p. 2917-2919.

Research output: Contribution to journalArticle

Sashital, S. R. ; Krishnakumar, S. ; Esener, Sadik. / Synthesis and characterization of rf-planar magnetron sputtered KTa xNb1-xO3 thin films. In: Applied Physics Letters. 1993 ; Vol. 62, No. 23. pp. 2917-2919.
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