@inproceedings{a5a11dc180624c87a6954649c09296d1,
title = "DNA double-write photolithography: A synergy for top-down and bottom-up nanofabrication (abstract # 611)",
abstract = "Intrinsic programmability and other properties of DNA allow its use for bottom-up self-assembly and as a top-down photolithographic material. These capabilities provide considerable potential for many DNA technology applications. However, one limitation of UV patterning of DNA is that hybridization of complementary DNA sequences can only be carried out in areas not exposed to UV. Such UV single-write methods restrict the full potential for programmed DNA self-assembly. We now demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences.",
keywords = "Bottom-up, DNA, Nanofabrication, Photolithography, Self-assembly, Topdown",
author = "Heller, {Michael J.} and Youngjun Song",
year = "2015",
language = "English (US)",
series = "NSTI: Advanced Materials - TechConnect Briefs 2015",
publisher = "Taylor and Francis Inc.",
pages = "101--104",
editor = "Bart Romanowicz and Matthew Laudon",
booktitle = "NSTI",
note = "10th Annual TechConnect World Innovation Conference and Expo, Held Jointly with the 18th Annual Nanotech Conference and Expo, and the 2015 National SBIR/STTR Conference ; Conference date: 14-06-2015 Through 17-06-2015",
}