DNA double-write photolithography: A synergy for top-down and bottom-up nanofabrication (abstract # 611)

Michael (Mike) Heller, Youngjun Song

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Intrinsic programmability and other properties of DNA allow its use for bottom-up self-assembly and as a top-down photolithographic material. These capabilities provide considerable potential for many DNA technology applications. However, one limitation of UV patterning of DNA is that hybridization of complementary DNA sequences can only be carried out in areas not exposed to UV. Such UV single-write methods restrict the full potential for programmed DNA self-assembly. We now demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences.

Original languageEnglish (US)
Title of host publicationNSTI
Subtitle of host publicationAdvanced Manufacturing, Electronics and Microsystems - TechConnect Briefs 2015
EditorsBart Romanowicz, Matthew Laudon
PublisherTaylor and Francis Inc.
Pages101-104
Number of pages4
ISBN (Electronic)9781498747301
StatePublished - Jan 1 2015
Externally publishedYes
Event10th Annual TechConnect World Innovation Conference and Expo, Held Jointly with the 18th Annual Nanotech Conference and Expo, and the 2015 National SBIR/STTR Conference - Washington, United States
Duration: Jun 14 2015Jun 17 2015

Publication series

NameNSTI: Advanced Materials - TechConnect Briefs 2015
Volume4

Conference

Conference10th Annual TechConnect World Innovation Conference and Expo, Held Jointly with the 18th Annual Nanotech Conference and Expo, and the 2015 National SBIR/STTR Conference
CountryUnited States
CityWashington
Period6/14/156/17/15

Fingerprint

Photolithography
Nanotechnology
DNA
DNA sequences
Self assembly
Complementary DNA
Technology

Keywords

  • Bottom-up
  • DNA
  • Nanofabrication
  • Photolithography
  • Self-assembly
  • Topdown

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Fluid Flow and Transfer Processes
  • Biotechnology
  • Fuel Technology

Cite this

Heller, M. M., & Song, Y. (2015). DNA double-write photolithography: A synergy for top-down and bottom-up nanofabrication (abstract # 611). In B. Romanowicz, & M. Laudon (Eds.), NSTI: Advanced Manufacturing, Electronics and Microsystems - TechConnect Briefs 2015 (pp. 101-104). (NSTI: Advanced Materials - TechConnect Briefs 2015; Vol. 4). Taylor and Francis Inc..

DNA double-write photolithography : A synergy for top-down and bottom-up nanofabrication (abstract # 611). / Heller, Michael (Mike); Song, Youngjun.

NSTI: Advanced Manufacturing, Electronics and Microsystems - TechConnect Briefs 2015. ed. / Bart Romanowicz; Matthew Laudon. Taylor and Francis Inc., 2015. p. 101-104 (NSTI: Advanced Materials - TechConnect Briefs 2015; Vol. 4).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Heller, MM & Song, Y 2015, DNA double-write photolithography: A synergy for top-down and bottom-up nanofabrication (abstract # 611). in B Romanowicz & M Laudon (eds), NSTI: Advanced Manufacturing, Electronics and Microsystems - TechConnect Briefs 2015. NSTI: Advanced Materials - TechConnect Briefs 2015, vol. 4, Taylor and Francis Inc., pp. 101-104, 10th Annual TechConnect World Innovation Conference and Expo, Held Jointly with the 18th Annual Nanotech Conference and Expo, and the 2015 National SBIR/STTR Conference, Washington, United States, 6/14/15.
Heller MM, Song Y. DNA double-write photolithography: A synergy for top-down and bottom-up nanofabrication (abstract # 611). In Romanowicz B, Laudon M, editors, NSTI: Advanced Manufacturing, Electronics and Microsystems - TechConnect Briefs 2015. Taylor and Francis Inc. 2015. p. 101-104. (NSTI: Advanced Materials - TechConnect Briefs 2015).
Heller, Michael (Mike) ; Song, Youngjun. / DNA double-write photolithography : A synergy for top-down and bottom-up nanofabrication (abstract # 611). NSTI: Advanced Manufacturing, Electronics and Microsystems - TechConnect Briefs 2015. editor / Bart Romanowicz ; Matthew Laudon. Taylor and Francis Inc., 2015. pp. 101-104 (NSTI: Advanced Materials - TechConnect Briefs 2015).
@inproceedings{a5a11dc180624c87a6954649c09296d1,
title = "DNA double-write photolithography: A synergy for top-down and bottom-up nanofabrication (abstract # 611)",
abstract = "Intrinsic programmability and other properties of DNA allow its use for bottom-up self-assembly and as a top-down photolithographic material. These capabilities provide considerable potential for many DNA technology applications. However, one limitation of UV patterning of DNA is that hybridization of complementary DNA sequences can only be carried out in areas not exposed to UV. Such UV single-write methods restrict the full potential for programmed DNA self-assembly. We now demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences.",
keywords = "Bottom-up, DNA, Nanofabrication, Photolithography, Self-assembly, Topdown",
author = "Heller, {Michael (Mike)} and Youngjun Song",
year = "2015",
month = "1",
day = "1",
language = "English (US)",
series = "NSTI: Advanced Materials - TechConnect Briefs 2015",
publisher = "Taylor and Francis Inc.",
pages = "101--104",
editor = "Bart Romanowicz and Matthew Laudon",
booktitle = "NSTI",

}

TY - GEN

T1 - DNA double-write photolithography

T2 - A synergy for top-down and bottom-up nanofabrication (abstract # 611)

AU - Heller, Michael (Mike)

AU - Song, Youngjun

PY - 2015/1/1

Y1 - 2015/1/1

N2 - Intrinsic programmability and other properties of DNA allow its use for bottom-up self-assembly and as a top-down photolithographic material. These capabilities provide considerable potential for many DNA technology applications. However, one limitation of UV patterning of DNA is that hybridization of complementary DNA sequences can only be carried out in areas not exposed to UV. Such UV single-write methods restrict the full potential for programmed DNA self-assembly. We now demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences.

AB - Intrinsic programmability and other properties of DNA allow its use for bottom-up self-assembly and as a top-down photolithographic material. These capabilities provide considerable potential for many DNA technology applications. However, one limitation of UV patterning of DNA is that hybridization of complementary DNA sequences can only be carried out in areas not exposed to UV. Such UV single-write methods restrict the full potential for programmed DNA self-assembly. We now demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences.

KW - Bottom-up

KW - DNA

KW - Nanofabrication

KW - Photolithography

KW - Self-assembly

KW - Topdown

UR - http://www.scopus.com/inward/record.url?scp=84983283582&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84983283582&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84983283582

T3 - NSTI: Advanced Materials - TechConnect Briefs 2015

SP - 101

EP - 104

BT - NSTI

A2 - Romanowicz, Bart

A2 - Laudon, Matthew

PB - Taylor and Francis Inc.

ER -