A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Youngjun Song, Tsukasa Takahashi, Sejung Kim, Yvonne C. Heaney, John Warner, Shaochen Chen, Michael (Mike) Heller

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

Original languageEnglish (US)
Pages (from-to)22-28
Number of pages7
JournalACS applied materials & interfaces
Volume9
Issue number1
DOIs
StatePublished - Jan 11 2017
Externally publishedYes

Keywords

  • displacer effect
  • DNA
  • patterning
  • photolithography
  • self-assembly
  • thymine dimer

ASJC Scopus subject areas

  • Materials Science(all)

Fingerprint Dive into the research topics of 'A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication'. Together they form a unique fingerprint.

  • Cite this